We are excited to announce the official launch of our latest generation Automatic Spin Coater Series, specially engineered to meet the demanding requirements of materials science, nanotechnology, semiconductor research, and university laboratories worldwide.
We are excited to announce the official launch of our latest generation Automatic Spin Coater Series, specially engineered to meet the demanding requirements of materials science, nanotechnology, semiconductor research, and university laboratories worldwide.
This upgraded series offers significant improvements in user interface, programmability, and coating precision. Equipped with a high-resolution touchscreen control panel, users can now intuitively manage all parameters including spin speed, acceleration, and coating time. Up to 30 programmable recipes can be stored and accessed instantly, allowing seamless operation for repetitive experiments.
● Touchscreen Interface with Real-Time Process Display
● Precision Speed Control (300–10000 Rpm, ±1 Rpm Accuracy)
● Customizable Acceleration Profiles
● Multi-Step Recipe Programming for Complex Coating Sequences
● Vacuum Chuck System for Substrate Sizes Up to 4 Inches
● Corrosion-Resistant Stainless Steel Chamber
● Optional Add-Ons: Heatable Syringe, Anti-Vibration Base, Nitrogen Purge
● Semiconductor Wafer Photoresist Coating
● Solar Cell and Oled Fabrication
● Perovskite Thin Film Deposition
● Biological Membrane Coating
With enhanced mechanical stability and smart control algorithms, the Automatic Spin Coater Series ensures uniform film thickness, minimal edge effects, and excellent reproducibility—a perfect choice for high-precision laboratory research and industrial R&D.
We are now accepting global orders for this model and offer customized configurations to fit your specific experimental needs. Please contact our team for more information, technical datasheets, or to request a quotation.